Substrate Preparation for Manufacturing of Aluminum Nitride Layers

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dc.contributor.authorDallaeva, Dinara
dc.contributor.authorTománek, Pavel
dc.contributor.editorPihera, Josef
dc.contributor.editorSteiner, František
dc.date.accessioned2013-12-18T10:49:30Z
dc.date.available2013-12-18T10:49:30Z
dc.date.issued2013
dc.description.abstract-translatedAluminum nitrides layers prepared on sapphire substrates are examined. The substrate surface was treated by dry plasma etching. The morphology of aluminum nitride thin films was studied by atomic force microscopy. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films morphology on the formation conditions has been defined. The objective of the study contributes to the improvement of technological process of dry etching and film deposition.en
dc.format5 s.cs
dc.format.mimetypeapplication/pdf
dc.identifier.citationElectroscope. 2013, č. 5, EEICT + EDS.cs
dc.identifier.issn1802-4564
dc.identifier.urihttp://hdl.handle.net/11025/6618
dc.language.isoenen
dc.publisherZápadočeská univerzita v Plzni, Fakulta elektrotechnickács
dc.relation.ispartofseriesElectroscopecs
dc.rights© 2013 Electroscope. All rights reserved.en
dc.rights.accessopenAccessen
dc.subjecttenké vrstvycs
dc.subjectdepozicecs
dc.subjectnitridy hliníkucs
dc.subjectsuché leptánícs
dc.subjectzkoušení materiálucs
dc.subject.translatedthin filmsen
dc.subject.translateddepositionen
dc.subject.translatedalluminium nitridsen
dc.subject.translateddry etchingen
dc.subject.translatedmaterial testingen
dc.titleSubstrate Preparation for Manufacturing of Aluminum Nitride Layersen
dc.typečlánekcs
dc.typearticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen

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Číslo 5 (2013)
Číslo 5 (2013)