Thermal behaviour of magnetron sputtered tungsten and tungsten-boride thin films

Show simple item record
dc.contributor.authorAvotina, Liga
dc.contributor.authorBumbure, Lada
dc.contributor.authorGoldmane, Annija Elizabete
dc.contributor.authorVanags, Edgars
dc.contributor.authorRomanova, Marina
dc.contributor.authorSorokins, Hermanis
dc.contributor.authorZaslavskis, Aleksandrs
dc.contributor.authorKizane, Gunta
dc.contributor.authorDekhtyar, Yuri
dc.contributor.editorPinker, Jiří
dc.date.accessioned2022-11-03T14:10:30Z
dc.date.available2022-11-03T14:10:30Z
dc.date.issued2022
dc.description.abstract-translatedMagnetron sputtered tungsten and tungsten diboride nanofilms are proposed to be used in microelectronic devices. Methods of deposition for nanofilms on oxidized silicon followed by etching is among the techniques to be applied for production. However, physical-chemical interactions between various films need to be taken into account. Therefore, a complete surface and in-depth characterization of synthesized films is necessary. Tungsten and tungsten diboride nanofilms are deposited by magnetron sputtering technique, followed by plasma chemical and chemical etching. Characterization of the structures is separated in several main steps including surface morphology, analysis of element composition as well as characterization of thermal properties, including estimation of presence of thermally active emission centers and thermally induced chemical conversions.en
dc.description.sponsorshipERDF project No. 1.1.1.1/20/A/109 “Planar field emission microtriode structure”en
dc.format4 s.cs
dc.format.mimetypeapplication/pdf
dc.identifier.citation2022 International Conference on Applied Electronics: Pilsen, 6th – 7th September 2022, Czech Republic, p. 29-32.en
dc.identifier.isbn978-1-6654-9482-3
dc.identifier.urihttp://hdl.handle.net/11025/49845
dc.language.isoenen
dc.publisherFakulta elektrotechnická ZČUcs
dc.rights© IEEEen
dc.rights.accessopenAccessen
dc.subjectwolframcs
dc.subjectborid wolframucs
dc.subjectnanofilmycs
dc.subjecttepelné zpracovánícs
dc.subjecttepelně stimulovaná emise exoelektronůcs
dc.subject.translatedtungstenen
dc.subject.translatedtungsten diborideen
dc.subject.translatednanofilmsen
dc.subject.translatedthermal treatmenten
dc.subject.translatedthermally stimulated exoelectron emissionen
dc.titleThermal behaviour of magnetron sputtered tungsten and tungsten-boride thin filmsen
dc.typekonferenční příspěvekcs
dc.typeconferenceObjecten
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen

Files

Original bundle
Showing 1 - 2 out of 2 results
No Thumbnail Available
Name:
uvod.pdf
Size:
1.57 MB
Format:
Adobe Portable Document Format
Description:
Plný text
Download
No Thumbnail Available
Name:
Thermal_behaviour_of_magnetron_sputtered_tungsten_and_tungsten-boride_thin_films.pdf
Size:
1.85 MB
Format:
Adobe Portable Document Format
Description:
Plný text
Download
License bundle
Showing 1 - 1 out of 1 results
No Thumbnail Available
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed upon to submission
Description:
Download

Collections

Applied Electronics 2022
Applied Electronics 2022