Bulk and surface electronic states in the dosed semimetallic HfTe2

dc.contributor.authorEl Youbi, Zakariae
dc.contributor.authorJung, Sung Won
dc.contributor.authorMukherjee, Saumya
dc.contributor.authorFanciulli, Mauro
dc.contributor.authorSchusser, Jakub
dc.contributor.authorHeckmann, Olivier
dc.contributor.authorRichter, Christine
dc.contributor.authorMinár, Jan
dc.contributor.authorHricovini, Karol
dc.contributor.authorWatson, Matthew D.
dc.contributor.authorCacho, Cephise
dc.date.accessioned2020-09-07T10:00:16Z
dc.date.available2020-09-07T10:00:16Z
dc.date.issued2020
dc.description.abstractČlánek se zabývá popisem elektronové struktury dopovaného polokovu HfTe2 doplněnou o teoretické výpočty.cs
dc.description.abstract-translatedThe dosing of layered materials with alkali metals has become a commonly used strategy in ARPES experiments. However, precisely what occurs under such conditions, both structurally and electronically, has remained a matter of debate. Here we perform a systematic study of 1T-HfTe2, a prototypical semimetal of the transition metal dichalcogenide family. By utilizing photon energy-dependent angle-resolved photoemission spectroscopy (ARPES), we have investigated the electronic structure of this material as a function of potassium (K) deposition. From the kz maps, we observe the appearance of 2D dispersive bands after electron dosing, with an increasing sharpness of the bands, consistent with the wave-function confinement at the topmost layer. In our highest-dosing cases, a monolayerlike electronic structure emerges, presumably as a result of intercalation of the alkali metal. Here, by bringing the topmost valence band below EF, we can directly measure a band overlap of ∼0.2 eV. However, 3D bulklike states still contribute to the spectra even after considerable dosing. Our work provides a reference point for the increasingly popular studies of the alkali metal dosing of semimetals using ARPES.en
dc.format8 s.cs
dc.format.mimetypeapplication/pdf
dc.identifier.citationEL YOUBI, Z., JUNG, SW., MUKHERJEE, S., FANCIULLI, M., SCHUSSER, J., HECKMANN, O., RICHTER, CH., MINÁR, J., HRICOVINI, K., WATSON, MD., CACHO, C. Bulk and surface electronic states in the dosed semimetallic HfTe2. Physical Review B, 2020, roč. 101, č. 23. ISSN 2469-9950.en
dc.identifier.document-number541412000005
dc.identifier.doi10.1103/PhysRevB.101.235431
dc.identifier.issn2469-9950
dc.identifier.obd43930026
dc.identifier.urihttp://hdl.handle.net/11025/39624
dc.language.isoenen
dc.project.IDEF15_003/0000358/Výpočetní a experimentální design pokročilých materiálů s novými funkcionalitamics
dc.publisherAmerican Physical Societyen
dc.relation.ispartofseriesPhysical Review Ben
dc.rights© American Physical Societyen
dc.rights.accessopenAccessen
dc.subjectfotoemisecs
dc.subjectelektroncs
dc.subjectdichalkogenidycs
dc.subject.translatedphotoemissionen
dc.subject.translatedelectronen
dc.subject.translateddichalcogenidesen
dc.titleBulk and surface electronic states in the dosed semimetallic HfTe2en
dc.title.alternativeObjemové a povrchové elektronické stavy v dopovaném polokovu HfTe2cs
dc.typečlánekcs
dc.typearticleen
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen

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