Technical challenges of screen printing deposition for ultra-fine patterns
| dc.contributor.author | Fiala, Pavel | |
| dc.contributor.editor | Pihera, Josef | |
| dc.contributor.editor | Steiner, František | |
| dc.date.accessioned | 2012-11-08T09:55:08Z | |
| dc.date.available | 2012-11-08T09:55:08Z | |
| dc.date.issued | 2011 | |
| dc.description.abstract-translated | This paper presents a research focused on advanced screen printing technique development. In the paper it is shown that it is possible to realize structures with line width below 50 μm at the pitch below 100 μm and ultra-thin film deposition well below 1 μm by advanced screen printing technique. Screen printing quality and its resolution relate to many factors such as the type of mesh, emulsion, paste, the thickness of emulsion and squeegee speed and its hardness. These printing parameters and many others were analyzed in the presented research project. | en |
| dc.format | 5 s. | cs |
| dc.format.mimetype | application/pdf | |
| dc.identifier.citation | Electroscope. 2011, č. 3. | cs |
| dc.identifier.issn | 1802-4564 | |
| dc.identifier.uri | http://hdl.handle.net/11025/619 | |
| dc.language.iso | en | en |
| dc.publisher | Západočeská univerzita v Plzni, Fakulta elektrotechnická | cs |
| dc.relation.ispartofseries | Electroscope | cs |
| dc.rights | Copyright © 2007-2010 Electroscope. All Rights Reserved. | en |
| dc.rights.access | openAccess | en |
| dc.subject | depozice sítotiskem | cs |
| dc.subject | ultrajemnné vzory | cs |
| dc.subject.translated | screen printing deposition | en |
| dc.subject.translated | ultra-fine patterns | en |
| dc.title | Technical challenges of screen printing deposition for ultra-fine patterns | en |
| dc.type | článek | cs |
| dc.type | article | en |
| dc.type.status | Peer-reviewed | en |
| dc.type.version | publishedVersion | en |