Ultra-low-resistivity nitrogen-doped Cu2O thin films fabricated by reactive high-power impulse magnetron sputtering (HiPIMS)

dc.contributor.authorKoloros, Jan
dc.contributor.authorRezek, Jiří
dc.contributor.authorBaroch, Pavel
dc.contributor.editorRendl, Jan
dc.date.accessioned2025-11-15T19:13:02Z
dc.date.available2025-11-15T19:13:02Z
dc.date.issued2025
dc.description.sponsorshipThis work was supported by the project QM4ST, funded as project No. CZ.02.01.01/00/22_008/0004572 by P JAC, call Excellent Research.en
dc.format2 s.cs
dc.format.mimetypeapplication/pdf
dc.identifier.isbn978-80-261-1302-7
dc.identifier.urihttp://hdl.handle.net/11025/63998
dc.language.isoenen
dc.publisherZápadočeská univerzita v Plznics
dc.rights© Západočeská univerzita v Plznics
dc.subjectCu2Ocs
dc.subjectfilmcs
dc.subjectnízký odporcs
dc.subject.translatedCu2Oen
dc.subject.translatedfilmen
dc.subject.translatedlow resistivityen
dc.titleUltra-low-resistivity nitrogen-doped Cu2O thin films fabricated by reactive high-power impulse magnetron sputtering (HiPIMS)en
dc.typekonferenční příspěvekcs
dc.typeconferenceObjecten
dc.type.statusPeer-revieweden
dc.type.versionpublishedVersionen
local.files.count2*
local.files.size2062803*
local.has.filesyes*

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